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FabLitho | FAR

FabLitho

Advanced Lithography Modeling and Simulation Tool

Lithography Simulation Platform Resist Modeling Weakpoint Optimization

FabLitho is a leading lithography modeling and simulation tool in China, designed to build litho models incorporating lens aberrations for various projection systems. It employs high-degree-of-freedom modeling techniques to simulate photoresist behaviors under different process conditions. 

  • Optimized for advanced technology nodes

  • Serves diverse applications, including semiconductor manufacturing, flat-panel display production, and advanced chip packaging

  • Successfully validated by several top-tier Foundries

  • Utilizes rigorous simulation methodologies to determine process windows across various parameter settings, significantly reducing wafer exposures and manual measurements, thereby enhancing process development efficiency

  • Seamlessly integrates with other process simulation tools, enabling critical pattern process optimization for mask designs and mitigating the risk of pattern failure in production

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Highlights

  • Industry-Standard Optical Modeling

    Supports
    mask 3D effects
    and freeform source modeling

  • Advanced Scanner Modeling

    Supports arbitrary magnification,
    oblique incidence, lens Zernike aberrations,
    and Jones Pupil

  • Comprehensive Empirical Modeling

    Supports industry-standard Dill model,
    PEB diffusion and reaction effects,
    development effects, and shrinkage modeling

  • Diverse Exposure Processes

    Capable of handling single exposure,
    multiple exposure (LLE),
    and multi-focal lithography

  • Resist Model Building&Optimization

    Build-in parameter optimization engine
    Capable of fitting resist model parameters
    based on wafer data

  • Rich GUI Design

    Intuitive GUI designs
    for internal and external
    data visualization

  • Extensible Development API

    Built-in C and Python API
    JSON and CSV data exchange

  • Versatile Data Export Formats

    Supports export to TXT,
    GDSII, and STL formats

Applications

  • Lithography Window
    Simulation&Parameter
    Optimization

  • Simulation and Optimization of
    Critical Patterns

  • Assistance in OPC
    model Parameter Development

  • Photoresist
    Parameter Evaluation
    & Optimization

  • Parameter Evaluation
    & Optimization of
    Lithography Equipment

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